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Nicholas Xuanlai Fang

Contact Info

room 3-435B

Massachusetts Institute of Technology

77 Massachusetts Avenue

Cambridge, Masachusetts 02139


  • 1996


  • 1998


  • 2004



Research Interests

  • Optical Nanotechnology and Nanofabrication
  • Optical Instrumentation
  • Ultrasound Materials and Instrumentation
  • Lightweight Composite Materials
  • Tissue Engineering

Online Data

  • ResearchID: (
  • Google Scholar: (

Honors + Awards

  • 2013, Fellow, International Society for Nanomanufacturing (ISNM)
  • 2013, ASME Chao and Trigger Young Manufacturing Engineer Award
  • 2011, ICO prize/Ernest Abbe Medal, the International Commission for Optics
  • 2009, NSF CAREER Award, Nanomanufacturing
  • 2008, Technology Review Magazine’s 35 Young Innovators Award


  • American Society of Mechanical Engineers (ASME)
  • American Physics Society (APS)
  • Materials Research Society (MRS)
  • Optical Society of America (OSA)
  • Institute of Electrical and Electronics Engineering (IEEE)    
  • The International Society of Optics and Photonics (SPIE)
  • Society of Manufacturing Engineers (SME)

Professional Service

  • 2013-present, Topic Editor in Chief, Frontiers in Optics and Photonics
  • 2012-present, Associate Editor, ASME Journal of Micro- and Nano-Manufacturing (JMNM)
  • 2009-present, Topic Co-Organizer, ASME symposium on Acoustic and Phononic Metamaterials

MIT Service

  • 2011-present, Deparment Graduate Admissions Committee


  • Optics (2.71/2.710)
  • Photonic Materials (2.718/2.719)
  • Thermal-Fluids Engineering II(2.006)
  • Instrument and Measurement (2.671)
  • Thermal-Fluidic Science in the Kitchen (2.S993)


  • Dafei Jin, Qing Hu, Daniel Neuhauser, Felix von Cube, Yingyi Yang, Ritesh Sachan, Ting S Luk, David C Bell, Nicholas X Fang,"Quantum-Spillover Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics", Phys. Rev. Lett., 115, 193901 (2015)

  • Anshuman Kumar, Tony Low, Kin Hung Fung, Phaedon Avouris, Nicholas X Fang, "Tunable Light–Matter Interaction and the Role of Hyperbolicity in Graphene–hBN System", Nano Lett.15(5), 3172-3180(2015).

  • C. Shen, J. Xu, N. X. Fang, Y. Jing, “Anisotropic Complementary Acoustic Metamaterial for Canceling out Aberrating Layers”, Phys Rev X, 4, 041033 (2014).

  • X. Zheng, H. Lee, T.H. Weisgraber, M. Shusteff, J. Deotte, E. B. Duoss, J. D. Kuntz, M. M. Biener, Q. Ge, J. A. Jackson, S. O. Kucheyev, N. X. Fang, and C.M. Spadaccini, "Ultralight, Ultrastiff Mechanical Metamaterials", Science, 344, 1373(2014).
  • Anshuman Kumar, Kin Hung Fung, M. T. Homer Reid, and Nicholas X. Fang, "Photon emission rate engineering using graphene nanodisc cavities",Opt. Express, 22, 6400(2014)   
  • N. Boechler, J. K. Eliason, A. Kumar, A. A. Maznev, K. A. Nelson, and N. Fang, " Interaction of a Contact Resonance of Microspheres with Surface Acoustic Waves", Phys. Rev. Lett., 111, 036103(2013).
  • D. Jin, A. Kumar, K. H. Fung, J. Xu and N. X. Fang, "Terahertz plasmonics in ferroelectric-gated graphene", Appl. Phys. Lett., 102, 201118(2013).
  • X. Dang,  J. Qi, M. Klug, P-Y. Chen, D. S. Yun, N. X. Fang, P. Hammond, and A. Belcher, "Tunable localized surface plasmon-enabled broadband light harvesting enhancement for high-efficiency panchromatic dye-sensitized solar cells", Nano Letters, 13, 637 (2013).
  • Howon Lee, Jiaping Zhang, Hanqing Jiang, and Nicholas X. Fang, "Prescribed Pattern Transformation in Swelling Gel Tubes by Elastic Instability",Phys. Rev. Lett., 108, 214304(2012).
  • Cui Y., K. H. Fung, J. Xu, H. Ma, J. Yi, S. He, and N. X. Fang, “Ultra-broadband Light Absorption by a Sawtooth Anisotropic Metamaterial Slab”,  Nano Letters 12, 1443(2012).   
  • Kumar A., K. H. Hsu, K. E. Jacobs, P.M. Ferreira, and N.X. Fang, “Direct metal nano-imprinting using an embossed solid electrolyte stamp”, Nanotechnology, Vol. 22:2, art no 155302(2011)
  • Zhang, S., C. Xia and N. X. Fang, “Broadband Acoustic Cloak For Ultrasound Waves,” Phys. Rev. Lett, Vol 106, 024301, 2011.


  • US Patent No. 7,998,330,” Direct Nanoscale Patterning of Metals Using Polymer Electrolytes,” N. Fang, P. M. Ferreira, K. H. Hsu, P. Schultz, and A. Kumar,  2011

  • US Patent No. 8,980,656, "Method of Forming an Array Of High Aspect Ratio Semiconductor Nanostructures", X. Li, N. Fang, P, Ferreira, W. Chern, I, Chun, K. Hsu, 2015

  • US Patent Application 13/149773, "High Resolution Projection Micro Stereolithography System And Method", Christopher M Spadaccini, George Farquar, Todd Weisgraber, Steven Gemberling, Nicholas Fang, Jun Xu, Matthew Alonso, Howon Lee, 2011

  • US Patent Application 62/192124, "Low-cost, Light-weight, Passive Hearing Protector", Nicholas Fang and Jun Xu, 2015